( e ) The SEM image of the nanochannel machined
with Selleckchem GS-9973 V stage of 200 nm/s. Figure 7 Schematic of material removal mechanisms by an AFM tip. ( a ) The SEM image of the diamond AFM tip. ( b ) The front view of the nanochannel fabrication process. The A-A cross-section indicated in Figure 7 ( b ) with the displacement of the tip relative to the sample during one scanning MK0683 supplier process in the ( c ) positive and ( d ) negative direction of x axis. Figure 8 shows the AFM and SEM images of the nanochannels scratched with the stage motion and the feed rate in the opposite direction. Figure 8a,b shows the AFM images of the nanochannel with the stage velocities of 80 nm/s (the condition shown in Figure 4d: V stage < V tip) and 200 nm/s (the condition shown in Figure 5c: V tip < V stage), respectively. For each case, the normal load is set to 72.12 μN. In Figure 8a, L 2 and L 3 are approximately 2.588 and 3.720 μm, respectively. The corresponding depths h 1, h 2, and h 3 are 203, 440, and 688 nm, respectively. L 3 is about 255 nm less than the value obtained by Equation
15 (3.975 μm). In Figure 7b, L 1 and L 2 are approximately 6.142 and 9.372 μm, respectively. The corresponding depths h 1 and h 2 are 241 and 395 nm, respectively. L 2 is about 638 nm less than the value obtained by Equation 18 (10 μm). Similar to the discussion above, by considering the time of the AFM tip returning to the initial position (1 shown in Figure 1c) to start the next scanning cycle (t) in both conditions, the periods of the ladder nanostructure have a value of V stage t larger than L stage that resulted from the continuous motion of the stage in this period of time. Meanwhile, this website the lengths of the overlapping Elongation factor 2 kinase region with the largest depth in the nanochannels have a length of V stage t less than the calculated values obtained by Equations 15 and 18. The real pitches (Δ) of these two conditions
are 27 and 42 nm, respectively, obtained by Equation 16. Moreover, the displacement of the tip relative to the sample in one scanning process is in the positive direction of x axis as shown in Figures 4a and 5a. From Figure 7c, it can be indicated that the edge of the tip plays a main role in the scratching test in these cases. Figure 8c shows the SEM image of the cutting chips after machining. It is indicated that within these feeds, materials are mainly removed by the cutting state with a relatively large attack angle (α), which is able to effectively remove material, and nanochannels with good quality can be achieved in these conditions. Figure 8 Nanochannels scratched with V stage and V tip in the opposite direction . ( a – b ) The AFM images of the machined nanochannel with different V stage. ( c ) The SEM image of the chips of the machined nanochannel. To show the capability of this method in creating large-scale channels with the ladder nanostructures, a set of nanochannels are fabricated on the sample.